Thin film deposition
evaporation (resistance-heated, electron-beam)
sputtering (dc-, rf-magnetron, ion-beam)
plasma enhanced chemical vapour deposition (PECVD)
NiCr, C, Pt, Ti, Au, Nb
For superconducting components a robust Nb/Al –AlOx
/Nb technology was developed. The technology allows the complex composition of 9-11 layered systems consisting of different metal, metal oxide and silicon oxide depositions.
Thereby you can create minuscule sensor chips such as Superconducting Quantum Interference Device.